文摘

硅和玻璃衬底上生长氧化锌薄膜脉冲激光沉积的论文

作者(年代):比卡Kumar Das

薄膜找到发展微电子设备,广泛应用于传感器、抗反射和先进设备防护涂料、透明电极等。这些使设备通用,更有效率。各种技术被设计了高质量的薄膜生长。一个这样的先进技术是脉冲激光沉积技术受到物理汽相沉积技术的范畴。在这种技术材料沉积即目标,使用激光脉冲熔化导致等离子体的形成。这种等离子体与背景气体进入真空室提供。最后到对象涂材料即衬底、薄膜沉积和成核。骑士是一个简单,快速和经济的技术。高质量的电影与所需的晶体结构可以使用这种技术。然而涉及很多因素决定了电影质量像压力优化,目标成分和形式,衬底温度和激光脉冲特性。项目处理的氧化锌沉积硅和石英基质由骑士技术和研究薄膜的紫外可见光谱特征。 Zinc Oxide is considered to be a future material due to its multifunctional properties. It crystallizes in two structures viz. Hexagonal wurtzite and Cubic zinc blend. Its high conductivity and low thermal expansion leads to its wide application in ceramics. The striking feature of ZnO is that it is a wide direct band gap semiconductor with a band gap of 3.25eV which corresponds to energy in the UV range. It is a potential material to develop optoelectronic devices that would emit radiations in UV range. Besides the binding energy of excitons is 60 meV. This makes the excitons stable at room temperature (energy equivalent of which is 25 meV) and hence is an essential feature for lasing action. Developing ZnO oxide thin films facilitates research to develop ZnO optoelectronic devices. The project involves the study of the PLD technique and its various aspects like optimization conditions and film growth. A study has been made on the objective behind developing ZnO thin films. The study has inspired me to get involved in developing higher quality thin films for manufacturing optoelectronic devices made up of ZnO.